Achievement System - EZAKI Hiromi | Tokyo Polytechnic University

（Last updated : 2025-06-02 16:21:26）

EZAKI Hiromi

Department / Course Tokyo Polytechnic University Faculty of Engineering Department of Engineering - Electrial and Electronics Course

Job Professor

Academic background
1987/04/01～1989/03/31	Graduate School, Doctral Research Course in Human Culture Ochanomizu University Mathematical physics and fundamental theory of condensed matter physics
1987/04/01～1989/03/31	Doctorial Graduate School, Doctral Research Course in Human Culture Ochanomizu University Expired with Credits Obtained Mathematical physics and fundamental theory of condensed matter physics
1985/04/01～1987/03/31	Master Graduate School, Division of Natural Science Ochanomizu University Finished Mathematical physics and fundamental theory of condensed matter physics
1981/04/01～1985/03/31	Faculty of Science Ochanomizu University Graduated

Business career
2007/04/01 ～	Professor Tokyo Polytechnic University Faculty of Engineering Department of Engineering - Electrial and Electronics Course

Present specialized field
Mathematical physics and fundamental theory of condensed matter physics, Optical engineering and photon science

Book and thesis
Papers	Improvement of Two-Photon Absorption Lithography Proceeding of the symposium on Optical Microlithography XV The International Society for Optical Engineering 4691,pp.1584-1591. 2002/07/01
Papers	Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist Proceeding of the symposium on Optical Microlithography XVI The International Society for Optical Engineering 5040,pp.1270-275. 2003/07/01
Papers	Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist_ "Proceeding of the symposium on Optical Microlithography XVI_ The International Society for Optical Engineering_ 5040_,pp.pp.1270-0-1275_ 2003/07/01
Papers	Super-resolution by polarization-dependent two-photon absorption in Optical lithography Nonlinear Optics Quantum Optics 32,pp.211-220. 2004/07/01
Papers	Super-Resolution by Polarization-Dependent Two-Photon Absorption in Optical Lithography Nonlinear Optics_ Quantum Optics_ Vol. 32_,pp.pp.211-11-220 2004/07/01
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Academic conference presentation
2005/03/01	Considering the flare by introducing the random aberration and non-conserved aberration (3)
2004/02/01	Random aberration and local flare (3)
2003/02/01	Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist (1)
2002/03/01	Improvement of two-photon absorption lithography (3)

Research topic, funded research, and department laboratory expense
	Quantum Manipulation of Radiation Fiald and Mattes and its A pplication to Quantum Lnformatian Proc(]E88B4[)ssing Individual Research 個人研究

Department laboratory expense researcher number
90213545