研究・制作業績システム - 小林　信一

コバヤシ　シンイチ KOBAYASHI Shin-ichi
小林　信一

所属東京工芸大学工学部工学科

職名教授

著書・論文歴
論文	マルチスペクトルカメラを搭載したドローンによるインデックスマッピングとフルカラー３D造形日本写真学会誌 86 (1),50-55頁 (共著) 2023/01/18
論文	Photocatalytic properties of annealed TiO2 films with controlled structure fabricated using oxygen-ion-assisted reactive evaporation with glancing angle deposition technique 12 (1) (共著) 2022/01/12
論文	Top-emission organic light emitting diode with indium tin oxide topelectrode films deposited by a low-damage facing-target type sputtering method Thin Solid Films Vol.698,137868-137868頁 (共著) 2020/02/01
論文	Reactive sputter deposition of WO3 films by using two deposition methods J. Vacuum Science & Technology A Vol. 37,31514-31514頁 (共著) 2019/05/01
論文	Crystal Orientation and Electrical Properties of Tin Oxide Transparent Conducting Films Deposited on Rutile Surface 250,12021-12021頁 (共著) 2017/10/01
論文	IR Spectroscopic Study of Silicon Nitride Films Grown at a Low Substrate Temperature Using Very High Frequency Plasma-Enhanced Chemical Vapor Deposition World Journal of Condensed Matter Physics Vol6, No.4,287-293頁 (単著) 2016/11/01
論文	Improvement in Luminance Efficiency of Organic Light Emitting Diodes by Suppression of Secondary Electron Bombardment of Substrate during Sputter Deposition of Top Electrode Films Japanese Jouenal of Applied Physics Voi.55, No.10,106501-106501頁 (共著) 2016/09/01
論文	有機EL素子作製のための低ダメージスパッタ堆積法の開発 J. the Vacuum Society of Japan Voｌ. 59,59-64頁 (共著) 2016/03/01
論文	Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods Applied Surface Science,389-394頁 (共著) 2013/11/01
論文	Electron-Bombardment-Induced Damage to Organic Light Emission Layer Jpn J Appl Phys 49 (4),42103-42103頁 (共著) 2010/04/20
論文	Effect of isochronal hydrogen annealing on surface roughness and threading dislocation density of epitaxial Ge films grown on Si 518 (6),S136-S139頁 (共著) 2010/01/01
論文	Deposition of Luminescent a-SiNx:H Films with SiH4 - N2 Gas Mixture by VHF-PECVD Using Novel Impedance Matching Method J. Material Science: Materials in Electronics,pp.29-29-32頁 (共著) 2007/07/01
論文	Preferential growth of μc-Ge : H along the crystallographic axes of Si and Ge substrates by ECR plasma CVD 14 (45211),741-743頁 (共著) 2003/04/01
論文	Segregation and diffusion of impurities from doped Si1-xGex films into silicon 369 (44928),222-225頁 (共著) 2000/07/01
論文	Segregation and diffusion of phosphorus from doped Si1-xGex films into silicon 86 (10),5480-5483頁 (共著) 1999/11/15
論文	Phosphorus diffusion from doped Si1-xGex films into silicon 568,265-269頁 (共著) 1999/04/01
論文	Initial growth characteristics of germanium on silicon in LPCVD using germane gas 174 (44930),686-690頁 (共著) 1997/04/01
論文	Selective germanium epitaxial growth on silicon using CVD technology with ultra-pure gases 99 (44930),259-262頁 (共著) 1990/01/01
論文	Selective Ge CVD as a Via Hole Filling Method and Self-Aligned Impurity Diffusion Microsource in Si Processing Jpn J Appl Phys 28 (11),L2054-L2056頁 (共著) 1989/11/20