Achievement System
Japanese
KOBAYASHI Shin-ichi
Department / Course
Tokyo Polytechnic University Faculty of Engineering Department of Engineering
Job
Professor
Book and thesis
Papers
3D Index Mapping and Full Color 3D Modelling by Drone Equipped with Multispectral Camera Journal of the Society of Photography and Imaging of Japan,pp.50-55 (Co-authored) 2023/01/18
Papers
Photocatalytic properties of annealed TiO2 films with controlled structure fabricated using oxygen-ion-assisted reactive evaporation with glancing angle deposition technique 12 (1) (Co-authored) 2022/01/12
Papers
Top-emission organic light emitting diode with indium tin oxide topelectrode films deposited by a low-damage facing-target type sputtering method Thin Solid Films Vol.698,pp.137868-137868 (Co-authored) 2020/02/01
Papers
Reactive sputter deposition of WO3 films by using two deposition methods J. Vacuum Science & Technology A Vol. 37,pp.31514-31514 (Co-authored) 2019/05/01
Papers
Crystal Orientation and Electrical Properties of Tin Oxide Transparent Conducting Films Deposited on Rutile Surface 250,pp.12021-12021 (Co-authored) 2017/10/01
Papers
IR Spectroscopic Study of Silicon Nitride Films Grown at a Low Substrate Temperature Using Very High Frequency Plasma-Enhanced Chemical Vapor Deposition World Journal of Condensed Matter Physics Vol6, No.4,pp.287-293 (Sole-authored) 2016/11/01
Papers
Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods Applied Surface Science,pp.389-394 (Co-authored) 2013/11/01
Papers
Electron-Bombardment-Induced Damage to Organic Light Emission Layer Jpn J Appl Phys 49 (4),pp.42103-42103 (Co-authored) 2010/04/20
Papers
Effect of isochronal hydrogen annealing on surface roughness and threading dislocation density of epitaxial Ge films grown on Si 518 (6),pp.S136-S139 (Co-authored) 2010/01/01
Papers
Deposition of Luminescent a-SiNx:H Films with SiH4 - N2 Gas Mixture by VHF-PECVD Using Novel Impedance Matching Method J. Material Science: Materials in Electronics,pp.pp.29-29-32 (Co-authored) 2007/07/01
Papers
Preferential growth of μc-Ge : H along the crystallographic axes of Si and Ge substrates by ECR plasma CVD 14 (45211),pp.741-743 (Co-authored) 2003/04/01
Papers
Segregation and diffusion of impurities from doped Si1-xGex films into silicon 369 (44928),pp.222-225 (Co-authored) 2000/07/01
Papers
Segregation and diffusion of phosphorus from doped Si1-xGex films into silicon 86 (10),pp.5480-5483 (Co-authored) 1999/11/15
Papers
Phosphorus diffusion from doped Si1-xGex films into silicon 568,pp.265-269 (Co-authored) 1999/04/01
Papers
Initial growth characteristics of germanium on silicon in LPCVD using germane gas 174 (44930),pp.686-690 (Co-authored) 1997/04/01
Papers
Selective germanium epitaxial growth on silicon using CVD technology with ultra-pure gases 99 (44930),pp.259-262 (Co-authored) 1990/01/01
Papers
Selective Ge CVD as a Via Hole Filling Method and Self-Aligned Impurity Diffusion Microsource in Si Processing Jpn J Appl Phys 28 (11),pp.L2054-L2056 (Co-authored) 1989/11/20
