Achievement System - TOYODA Mitsunori | Tokyo Polytechnic University

TOYODA Mitsunori

Department / Course Tokyo Polytechnic University Faculty of Engineering Department of Engineering

Job Professor

Book and thesis
Papers	Zero-order-free, multilayer-coated laminar grating in the 31 nm region 37 (4A),pp.2066-2067 (Co-authored) 1998/04/01
Papers	A soft-X-ray imaging microscope with a multilayer-coated Schwarzschild objective: Imaging tests 39 (4A),pp.1926-1929 (Co-authored) 2000/04/01
Papers	A soft-X-ray imaging microscope with multilayer-coated Schwarzschild optics 507,pp.363-366 (Co-authored) 2000/04/01
Papers	Development of Soft X-ray Wavefront Control Technology for Imaging Multilayer Mirrors 2nd International Symposium on Technologies and Applications of Photoelectron Micro-Spectroscopy with Laser-based VUV Sources (Tsukuba, Japan) (Co-authored) 2005/02/01
Papers	Schwarzschild microscope in vacuum ultraviolet and soft X-ray regions Nuclear Science and Techniques 16,pp.129-138 (Co-authored) 2005/04/01
Papers	Schwarzschild Microscope in Vacuum Ultraviolet and Soft X-Ray Regions Nuclear Science and Techniques 16(2005),pp.129-38. (Co-authored) 2005/06/01
Papers	Schwarzschild microscopes in vacuum ultraviolet and soft X-ray regions Nuclear Science and Techniques 16 (3),pp.129-138 (Co-authored) 2005/06/01
Papers	null The 8th International Conference on X-ray Microscopy (Himeji, Japan) (Co-authored) 2005/07/01
Papers	Analytical Designing of Two-Aspherical-Mirror Anastigmat Permitting Practical Misalignments for Soft-X-Ray Imaging IPAP Conference Series 7,pp.186-188 (Co-authored) 2005/07/26
Papers	Analytical Designing of Two-aspherical-mirror Anastigmats Permitting Practical Misalignments for Soft-X-ray Imaging IPAP Conf. Series 7,pp.186-188 (Co-authored) 2005/07/26
Papers	Analytical Designing of Two-Aspherical-Mirror Anastigmats Permitting Practical Misalignments in a Soft-X-Ray Optics Opt. Rev., 13 (2006),pp.149-157 (Co-authored) 2006/05/01
Papers	Analytical designing of two-aspherical-mirror anastigmats permitting practical misalignments in a soft-X-ray optics 13 (3),pp.149-157 (Co-authored) 2006/05/01
Papers	Analytical designing of two-aspherical-mirror anastigmats permitting practical misalignments in a soft-X-ray optics 13 (3),pp.149-157 (Co-authored) 2006/05/01
Papers	Soft X-Ray MCD Studies on Interfaces in Fe/Si Multilayers KEK Proceedings 2006-3 (2006),pp.348-352 (Co-authored) 2006/07/01
Papers	Soft X-ray MCD Studies on Interfaces in Fe/Si Multilayers KEK Proceedings (38777),pp.48-52 (Co-authored) 2006/07/03
Papers	Fe L2,3 MCD Spectra from Fe/Si Multilayers Photon Factory Activity Report 2005 Part B #23,pp.125 (Co-authored) 2006/12/01
Papers	X-ray magnetic circular dichroism studies for Fe/Si interfaces using standing waves 83 (1),pp.012012-1-6 (Co-authored) 2007/06/01
Papers	Design of Aspherical Imaging Optics ToleratingPractical Misalignments for Soft-X-Ray Microscopes 15th International Conference on Vacuum Ultraviolet Radiation Physics (Berlin, Germany) (Co-authored) 2007/07/01
Papers	Development of Transmission-type X-ray Multilayer Mirror Microscope using LPP source 15th International Conference on Vacuum Ultraviolet Radiation Physics (Berlin, Germany) (Co-authored) 2007/07/01
Papers	X-ray MCD studies for Fe/Si interfaces using standing waves 15th International Conference on Vacuum Ultraviolet Radiation Physics (Berlin, Germany) (Co-authored) 2007/07/01
Papers	High throughput EUV Microscope TXM3 for single shot imaging The 9th International Conference on the Physics of X-Ray Multilayer Structures (Montana, USA) (Co-authored) 2008/02/01
Papers	Analytical Designing of Two-Aspherical-Mirror Optics for Soft X-Ray Imaging 9th International Conference on X-Ray Microscopy (Zurich, Switzerland) (Co-authored) 2008/07/01
Papers	Exact Period Thickness Control of Soft X-ray Multilayers on Curved Substrates 9th International Conference on X-Ray Microscopy (Zurich, Switzerland) (Co-authored) 2008/07/01
Papers	Cluster size dependence of the multiphoton absorption of argon clusters in intense EUV-FEL pulses 11th International Conference on Multiphoton Processes (Heidelberg, Germany) (Co-authored) 2008/09/01
Papers	Cluster size dependence of the multiple ionization of Ar clusters irradiated by intense EUV pulses from free electron laser XIV International Symposium on Small Particles and Inorganic Clusters (Valladolid, Spain) (Co-authored) 2008/09/01
Papers	Interaction of intense EUV femtosecond laser pulses from free electron laser with rare gas clusters 11th International Conference on Multiphoton Processes (Heidelberg, Germany) (Co-authored) 2008/09/01
Papers	Laser power dependence of the multiple ionization of Xe clusters irradiated by intense EUV pulses from free electron laser XIV International Symposium on Small Particles and Inorganic Clusters (Valladolid, Spain) (Co-authored) 2008/09/01
Papers	Multiple ionization of rare gas clusters using the EUV-FEL at SPring-8 11th International Coference on Multiphoton Processes (Heidelberg, Germany) (Co-authored) 2008/09/01
Papers	Multiple photoionization of rare gas clusters in intense EUV femtosecond laser pulse from free electron laser XIV International Symposium on Small Particles and Inorganic Clusters (Valladolid, Spain) (Co-authored) 2008/09/01
Papers	XMCD study on Co-Pt films with giant perpendicular magnetic anisotropy Photon Factory Activity Report 2007 Part B,pp.153 (Co-authored) 2009/02/01
Papers	Dead-time-free ion momentum spectroscopy of multiple ionization of Xe clusters irradiated by euv free-electron laser pulses 79 (3),pp.031201-1-031201-4 (Co-authored) 2009/03/01
Papers	Design study of two-aspherical-mirror anastigmat with reduced sensitivities to misalignments: Correction of higher-order aberrations 186,pp.12076 (Co-authored) 2009/04/01
Papers	Frustration of direct photoionization of Ar clusters in intense extreme ultraviolet pulses from a free electron laser 42 (13),pp.134019-1-134019-5 (Co-authored) 2009/04/01
Papers	Momentum spectroscopy of fragment ions emitted from Xe clusters irradiated by EUV-FEL at SPring-8 194,pp.012052-1-012052-7 (Co-authored) 2009/04/01
Papers	Frustration of direct photoionizations of Argon cllusters irradiated with intense EUV-FEL pulses XXVI International Conference on Photonic Electronic and Atomic Collisions (Kalamazoo, USA) (Co-authored) 2009/07/01
Papers	Multi-coincidence ion detection system for EUV-FEL fragmentation experiments at SPring-8 606 (3),pp.770-773 (Co-authored) 2009/07/21
Papers	Counting statistics in EUV-FEL shot-by-shot measurement for Ar cluster International Workshop on Electronic Spectroscopy for Gas-phase molecules and Solid Surfaces (Matsushima, Japan) (Co-authored) 2009/12/01
Papers	Multiple ionizations of rare-gas clusters by extreme ultraviolet free-electron laser at SPring-8 International Workshop on Electronic Spectroscopy for Gas-phase molecules and Solid Surfaces (Matsushima, Japan) (Co-authored) 2009/12/01
Papers	High throughput and wide field of view EUV microscope for blur-free one-shot imaging of living organisms 18 (7),pp.7203-7209 (Co-authored) 2010/03/01
Papers	High throughput and wide field of view EUV microscope for blur-free one-shot imaging of living organisms 18 (7),pp.7203-7209 (Co-authored) 2010/03/29
Papers	Aplanatic three-mirror objective for high-magnification soft X-ray microscopy 1365,pp.176-179 (Co-authored) 2010/04/01
Papers	Frustration of direct photoionizations of rare gas clusters in intense extreme ultraviolet free-electron laser pulses 212,pp.12014 (Co-authored) 2010/04/01
Papers	High throughput and wide field of view EUV microscope for blur-free one-shot imaging of living organisms The virtual Journal Biomedical Optics 5 (Co-authored) 2010/07/01
Papers	Theoretical investigation of the meaning of odd-order aspherical surface and numerical confirmation of effectiveness in rotational-symmetric but off-axis optics 49 (7),pp.73003 (Co-authored) 2010/07/01
Papers	"Super‐Hierarchical" Microscope in EUV Region The 10th international conference on x-ray microscopy (Chicago, USA) (Co-authored) 2010/08/01
Papers	Development of Wide Field of View EUV Microscope Using Normal Incident Multilayer Optics with LPP Light Source he 10th international conference on x-ray microscopy (Chicago, USA) (Co-authored) 2010/08/01
Papers	Novel multilayer-mirror optics for a whole tissue imaging The 10th international conference on x-ray microscopy (Chicago, USA) (Co-authored) 2010/08/01
Papers	Closed-Form representations for Third-Order aberrations of Two-Aspherical mirror aplanats with the mirror tilt and decenter 18 (6),pp.441-447 (Sole-authored) 2011/11/01
Papers	Closed-form representations for third-order aberrations of two-aspherical mirror aplanats with the mirror tilt and decenter 18 (6),pp.441-447 (Sole-authored) 2011/11/01
Papers	An EUV Mask-imaging Microscope for Lithography Generations with sub-16 nm Half Pitch 25th International Microprocesses and Nanotechnology Conference (Kobe, Japan) (Co-authored) 2012/01/01
Papers	At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (Hawaii, USA) (Co-authored) 2012/05/01
Papers	At-Wavelength Observation of EUV Lithography Mask Using a High-Magnification Objective with Three Multilayer Mirrors 2012 International Symposium on Extream Ultraviolet Lithography, (Brussels, Belgium) (Sole-authored) 2012/09/01
Papers	At-wavelength extreme ultraviolet lithography mask observation using a high-magnification objective with three multilayer mirrors 5 (11),pp.112501 (Co-authored) 2012/11/01
Papers	At-Wavelength Extreme Ultraviolet Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors 5 (11) (Co-authored) 2012/11/01
Papers	Design, fabrication, and test of an EUV mask imaging microscope for lithography generations with sub-16 nm half pitch 2013 International Symposium on Extreme Ultraviolet Lithography (Toyama, Japan) (Co-authored) 2013/01/01
Papers	Extreme ultraviolet mask defect observation using an extreme ultraviolet microscope 8880,pp.88802I (Co-authored) 2013/04/01
Papers	Observation of residual-type thin absorber defect on extreme ultraviolet lithography mask using an extreme ultraviolet microscope 6 (4),pp.46501 (Co-authored) 2013/04/01
Papers	Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability Jpn. J.Appl .Phys. 52(2013),pp.96601-96601 2013/08/01
Papers	Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability Jpn. J. Appl. Phys. 52,pp.96601 (Co-authored) 2013/08/01
Papers	Simulation analysis of the characteristics of a high magnification imaging optics for the observation of extreme ultraviolet lithography mask to predict phase defect printability 52 (9) (Co-authored) 2013/09/01
Papers	Design, fabrication, and test of a novel wide field microscope objective for extreme ultraviolet multiscale imaging. The 12th Symposium on X-ray Imaging Optics (Osaka, Japan) (Sole-authored) 2013/11/01
Papers	At wavelength observation of phase defect embedded in EUV mask using microscope technique 9048 (Co-authored) 2014/04/01
Papers	Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope 13 (2) (Co-authored) 2014/04/01
Papers	Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope 9048 (2),pp.23012 (Co-authored) 2014/04/01
Papers	Observation of Phase Defect on Extreme Ultraviolet Mask Using an Extreme Ultraviolet Microscope J. Micro/Nanolith. MEMS MOEMS 13 (2014),pp.23012-23012 (Co-authored) 2014/06/01
Papers	Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme ultraviolet microscopy: Imaging test by observing lithography mask 7 (10),pp.102502-1-102502-4 (Co-authored) 2014/10/01
Papers	Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme ultraviolet microscopy: Imaging test by observing lithography mask 7 (10) (Co-authored) 2014/10/01
Papers	Flat-Field Anastigmatic Mirror Objective for High-Magnification Extreme Ultraviolet Microscopy Adv. Opt. Techn. 4 (2015),pp.339–346-339–346 (Sole-authored) 2015/06/01
Papers	Flat-field anastigmatic mirror objective for high-magnification extreme ultraviolet microscopy 4 (4),pp.339-346 (Sole-authored) 2015/08/01
Papers	EUV Multilayer Mirrors for Focusing Isolated Attosecond Pulse in 40 nm Wavelength Region UVSOR ACTIVITY REPORT 43,pp.36 (Co-authored) 2016/04/01
Papers	Low-order aberration correction of extreme ultraviolet imaging objective with deformable multilayer mirrors 9th edition of the MEDSI conference (Barcelona, Spain) (Co-authored) 2016/09/01
Papers	Low-Order Aberrations Correction of Extreme Ultraviolet Imaging Objective with Deformable Multilayer Mirrors Proc. 9th Edition of the Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation Conf. (MEDSI'16) TUPE22,pp.213-215 (Co-authored) 2016/09/11
Papers	Point Diffraction Interferometer for Inspection of High-Magnification Objective for Extreme Ultraviolet Microscopy The 61st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (Orlando, USA) (Co-authored) 2017/06/01
Papers	Imaging Properties of an Extreme Ultraviolet Microscope Objective with Reduced Fresnel Number Opt. Commun. 405 (2017),pp.312-17. (Co-authored) 2017/09/01
Papers	Imaging properties of an extreme ultraviolet microscope objective with reduced Fresnel number 405,pp.312-317 (Co-authored) 2017/12/15
Papers	Multilayer Mirrors for Focusing Objective in 40-nm Wavelength Region 202,pp.287-290 (Co-authored) 2018/04/01
Papers	null PXRNMS2018 International Workshop 2018/11/07
Papers	Global optimization of two-multilayer mirror objective for focusing soft X-ray high harmonics Proc. SPIE, EUV and X-ray Optics: Synergy between Laboratory and Space VI 11032,pp.110320P (Co-authored) 2019/04/01
Papers	null Proc. SPIE, EUV and X-ray Optics: Synergy between Laboratory and Space VI 11032,pp.110320P-110320P (Co-authored) 2019/04/01
Papers	null Appl. Phys. Express 13,pp.82011-82011 (Co-authored) 2020/08/01
Papers	Staining-free observation of polymer blend thin films on transmission extreme ultraviolet microscopy 13 (8) (Co-authored) 2020/08/01
Papers	null Appl. Phys. Express 4,pp.52003-52003 (Co-authored) 2021/04/01
Papers	Removal of Mo/Si multilayer coatings on fused silica substrates by wet chemical etching 14 (5) (Co-authored) 2021/05/01
Papers	null Jpn. J. Appl. Phys. in press (Co-authored) 2021/07/01
Papers	Development of a high-power EUV irradiation tool in a hydrogen atmosphere 60 (8),pp.87005-87005 (Co-authored) 2021/08/01
Papers	Conservation of energy between pupil and image for point spread function Optik 249,pp.168189-168189 (Co-authored) 2021/10/01
Papers	Conservation of energy between pupil and image for point spread function 249 (Co-authored) 2022/01/01
Papers	Optical Design Method for Wide-Field Imaging Objective Made of Reflective Multilayer Mirrors for Extreme Ultraviolet Microscopy,pp.1-1 (Co-authored) 2022/06/01
Papers	Diffraction-limited imaging by extreme ultraviolet multilayer mirror objective and its application to staining-free observation of polymer blend samples Journal of JSSRR,pp.327 (Sole-authored) 2022/11/01
Papers	null Springer Proceedings in Physics 202,pp.287-290 (Co-authored)
Other	28aPS-4 Fe L_<2,3> MCD spectra from Fe/Si magnetic multilayers Meeting Abstracts of the Physical Society of Japan,pp.724-724 (Co-authored) 2006/04/01
Other	22pZF-3 Multiple ionization of atoms and clusters by EUV-FEL I. : Higher order light distributions measurements by recoil ion momentum spectroscopy Meeting Abstracts of the Physical Society of Japan,pp.146-146 (Co-authored) 2008/04/01
Other	22pZF-4 Multiple ionization of atoms and clusters by EUV-FEL II. : Cluster-size dependence of multiple photoionization processes Meeting Abstracts of the Physical Society of Japan,pp.146-146 (Co-authored) 2008/04/01
Other	22pZF-5 Multiple ionization of atoms and clusters by EUV-FEL III. : Intensity and wavelength dependence of multiple photoionization processes of clusters Meeting Abstracts of the Physical Society of Japan,pp.147-147 (Co-authored) 2008/04/01
Other	極紫外FEL光利用実験に用いる多粒子同期計測システムの開発ーKrクラスター実験での性能評価ー分子科学討論会講演プログラム&要旨(Web),pp.ROMBUNNO.3P039 (WEB ONLY) (Co-authored) 2008/04/01
Other	Frustration of direct photoionizations of argon clusters irradiated with intense EUV-FEL pulses Journal of Physics: Conference Series (Co-authored) 2009/12/24
Other	Development of Wavefront Error Corrected Soft X-Ray Multilayer Mirrors for Ultra-High Definition Bio-Imaging Japanese journal of optics,pp.219-224 (Co-authored) 2010/05/10
Other	Development of a common-path phase-shifting interference microscope using RGB three-color lasers (2) (Co-authored) 2018/04/01
Other	Formation of multicolor flip-books with Lithium-Niobate image-plane holograms (Co-authored) 2019/04/01
Other	Global Optimization Technique of Two-Glazing-Incidence-Mirror Objective for Soft-X-ray Focusing Applications (4) (Co-authored) 2020/04/01
Other	Optical Design of Enhancing Magnification Mo/Si Multilayer Mirror (Co-authored) 2020/04/01
Other	Lab-scale EUV Microscope for Stain-Free Visualization of Higher-Order Structures on Polymer Materials (Co-authored) 2020/04/01
Other	Image reconstruction from holographic flipbooks using white LED light sources (Co-authored) 2020/04/01
Other	Global Optimization Technique of Two-Glazing-Incidence-Mirror Objective for Soft-X-ray Focusing Applications (5) (Co-authored) 2021/04/01
Other	Optical Design Method for Wide-Field Imaging Objective Made of Reflective Multilayer Mirrors for Extreme Ultraviolet Microscopy (Co-authored) 2021/04/01
Other	Lab-scale EUV Microscope for Stain-Free Visualization of Higher-Order Structures on Polymer Materials (Co-authored) 2021/04/01
Other	High-Magnification Imaging Objective for Lab-Scale Extreme Ultraviolet Microscope (Co-authored) 2021/04/01